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Volumn 353, Issue 1, 1999, Pages 124-128

New method for making porous SiO2 thin films

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ANNEALING; CONDENSATION; DEPOSITION; FILM GROWTH; FILM PREPARATION; GELATION; HIGH TEMPERATURE EFFECTS; HYDROLYSIS; POROSITY; SILICA; THICKNESS MEASUREMENT;

EID: 0033333123     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00419-8     Document Type: Article
Times cited : (85)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.