Bonding structure of the cross-link in organosilicate films using O2/BTMSM precursors

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 4 A, 2003, Pages 1517-1520

  Oh, Teresa ^a   Lee, Kwang Man ^a   Ko, Sung Teak ^a   Kim, Kyung Sik ^a   Ahn, Khi Jung ^a   Choi, Chi Kyu ^a  

^a Jeju National University   (South Korea)

Author keywords

Cross link; Dielectric constant; Hybrid properties; Organometallic carbon; Organosilicate films

Indexed keywords

ANNEALING; CARBON; CHEMICAL BONDS; CROSSLINKING; INDUCTIVELY COUPLED PLASMA; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SILICATES; VACUUM APPLICATIONS; VAPORIZATION; X RAY PHOTOELECTRON SPECTROSCOPY;

FLOW RATE RATIO; INDUCTIVELY COUPLED PLASMA CHEMICAL VAPOR DEPOSITION; ORGANOSILICATE FILMS;

DIELECTRIC FILMS;

EID: 0037594123     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.1517     Document Type: Article

References (18)

1. M. A. Tamor and C. H. Wu: J. Appl. Phys. 67 (1990) 1007.
2. J. P. Chang and H. W. Krautter: J. Vac. Sci. Technol. A 17 (1999) 2969.
3. J. H. Kim, S. H. Seo, S. M. Yun, H. Y. Chang, K. M. Lee and C. K. Choi: Appl. Phys. Lett. 68 (1996) 1507.
4. C. Y. Wang: Thin Solid Films 397 (2001) 90.
5. A. Grill, V. Patel: Appl. Phys. Lett. 79 (2001) 803.
6. Y. Ohkawara and H. Saitoh: Jpn. J. Appl. Phys. 40 (2001) 7007.
7. T. Fukuda, N. Aoi and H. Matsunaga: Jpn. J. Appl. Phys. 41 (2002) L307.
8. A. Grill and V. Patel: J. Appl. Phys. 85 (1999) 3314.
9. Y. H. Kim, S. K. Lee and H. J. Kim: J. Vac. Sci. Technol. A 18 (2000) 1216.
10. J. Y. Kim, M. S. Hwang, Y. H. Kim, H. J. Kim and Y. Lee: J. Appl. Phys. 90 (2001) 2469.
11. Y. H. Kim and H. J. Kim: J. Korean Phys. Soc. 30 (2002) 94.
12. S. Y. Jing and C. K. Choi: J. Korean Phys. Soc. 39 (2001) 302.
13. C. S. Yang, K. S. Oh, J. Y. Ryu, D. C. Kim, S. Y. Jing, C. K. Choi, H. J. Lee, S. H. Um and H. Y. Chang: Thin Solid Films 390 (2001) 113.
14. J. H. Yun, E. S. Choi, C. M. Jang and C. S. Lee: Jpn. J. Appl. Phys. 41 (2002) L418.
15. S. Vallon, A. Hofrichter, B. Drevilon, J. E. K. Sapieha, L. Martinu and F. P. Epaillard: Thin Solid Films 290 (1996) 68.
16. X. Li, L. Liu and H. B. Schlegel: J. Am. Chem. Soc. 124 (2002) 9639.
17. H. L. Zhang, S. D. Evans, J. R. Henderson, R. E. Miles and T. H. Shen: Nanotechnol. 13 (2002) 439.
18. A. Kokil, I. Shiyanovskaya, K. D. Singer and C. Weder: J. Am. Chem. Soc. 124 (2002) 9978.