Stress evolution in Co/Ti/Si system

Materials Chemistry and Physics

Volumn 88, Issue 1, 2004, Pages 71-76

  Guo, S S ^a   Chu, Y C ^b   Tsai, C J ^b  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Cobalt silicides; Interlayer; Thin films

Indexed keywords

ANNEALING; COBALT; COBALT COMPOUNDS; NUCLEATION; PHASE TRANSITIONS; SILICON; STRESS ANALYSIS; SUBSTRATES; TITANIUM;

COBALT SILICIDES; INTERLAYERS; ISOCHRONAL ANNEALING; STRESS EVOLUTION;

THIN FILMS;

EID: 4644288422     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2004.06.011     Document Type: Article

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