High-resolution investigation of atomic interdiffusion during Co/Ni/Si phase transition

Journal of Applied Physics

Volumn 94, Issue 1, 2003, Pages 231-237

  Alberti, A ^a   Bongiorno, C ^a   La Via, F ^a   Spinella, C ^a  

^a CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANNEALING; NICKEL; PHASE TRANSITIONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

SHEET RESISTANCE;

COBALT;

EID: 0041339914     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1579552     Document Type: Article

References (11)

1. A. Alberti, F. La Via, and E. Rimini, Appl. Phys. Lett. 81, 55 (2002).
2. A. Alberti, F. La Via, V. Raineri, and E. Rimini, J. Appl. Phys. 86, 3089 (1999).
3. E. G. Colgan, C. Cabral, L. A. Clevenger, and J. M. E. Harper, Mater. Res. Soc. Symp. Proc. 387, 49 (1995).
4. A. Lauwers, A. Steegen, M. de Potter, R. Lindsay, A. Satta, H. Bender, and K. Maex, J. Vac. Sci. Technol. B 19, 2026 (2001).
5. V. Teodorescu, L. Nistor, H. Bender, A. Steegen, A. Lauwers, K. Maex, and J. Van Landuyt, J. Appl. Phys. 90, 167 (2001).
6. T. G. Finstad, D. D. Anfiteatro, V. R. Deline, F. M. D'Heurle, P. Gas, V. L. Moruzzi, K. Schwarz, and J. Tersoff, Thin Solid Films 135, 229 (1986).
7. F. M. D'Heurle, D. D. Anfiteatro, V. R. Deline, and T. G. Finstad, Thin Solid Films 128, 107 (1985).
8. C. Detavernier, R. L. Van Meirhaeghe, F. Cardon, and K. Maex, Phys. Rev. B 62, 12045 (2000).
9. C. Detavernier, R. L. Van Meirhaeghe, K. Maex, and F. Cardon, Mater. Res. Soc. Symp. Proc. 611, C7.9.1 (2000).
10. P. Gas and F. M. d'Heurle, Appl. Surf. Sci. 73, 153 (1993).
11. E. G. Gambino and J. P. Colgan, Mater. Chem. Phys. 52, 96 (1998).