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Volumn , Issue , 2006, Pages 607-610

Nanofabrication challenges for NEMS

Author keywords

MEMS; Microfabrication; Nanofabrication; NEMS

Indexed keywords

MOLECULES; NANOSTRUCTURES; SELF ASSEMBLY;

EID: 46149117033     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/NEMS.2006.334855     Document Type: Conference Paper
Times cited : (12)

References (11)
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  • 3
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  • 4
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    • Tseng, A.A.1    Notargiacomo, A.2    Chen, T.P.3
  • 7
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    • Fabrication of large area 100nm pitch grating by Spatial frequency doubling and nanoimprint lithography for subwavelength optical applications
    • Z. Yu, W. Wu. L. Chen, S.Y. Chou, "Fabrication of large area 100nm pitch grating by Spatial frequency doubling and nanoimprint lithography for subwavelength optical applications", J. Vac. Sci. Technol., B 19(6), 2001, pp.2816
    • (2001) J. Vac. Sci. Technol., B , vol.19 , Issue.6 , pp. 2816
    • Yu, Z.1    Chen, W.W.L.2    Chou, S.Y.3
  • 8
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    • Fabrication of 5nm linewidth and 14nm pitch features by nanoimprint lithography
    • M.D. Austin, H. Ge, W. Wu, M. Li, Z. Yu, D. Wasserman, S.A. Lyon, S..Y. Chou, "Fabrication of 5nm linewidth and 14nm pitch features by nanoimprint lithography", Appl. Phys. Lett., 84(26), 2004, pp.5299
    • (2004) Appl. Phys. Lett , vol.84 , Issue.26 , pp. 5299
    • Austin, M.D.1    Ge, H.2    Wu, W.3    Li, M.4    Yu, Z.5    Wasserman, D.6    Lyon, S.A.7    Chou, S.Y.8
  • 9
    • 14944368302 scopus 로고    scopus 로고
    • A systematic study of dry etch process for profile control of silicon tips
    • J. Tao, Y. Chen, A. Malik, L. Wang, X.Z. Zhao, H.W. Li, Z. Cui, "A systematic study of dry etch process for profile control of silicon tips", Microelectronic Eng., 78-9, 2005, pp.147
    • (2005) Microelectronic Eng , vol.78 -9 , pp. 147
    • Tao, J.1    Chen, Y.2    Malik, A.3    Wang, L.4    Zhao, X.Z.5    Li, H.W.6    Cui, Z.7
  • 10
    • 13244279807 scopus 로고    scopus 로고
    • Fabrication of sub-5nm gaps between metalic electrodes by conventional lithographic techniques
    • P. Steinmann, J.M.R. Weaver, "Fabrication of sub-5nm gaps between metalic electrodes by conventional lithographic techniques", J. Vac. Sci. Technol., B22(6), 2004, pp.3178
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  • 11
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    • Nanoelectromechanical switchs with vertically aligned carbon nanotubes
    • J.E. Jang, G.A.J Amaratunga, et al, "Nanoelectromechanical switchs with vertically aligned carbon nanotubes", Appl. Phys. Lett., 87, 163114 (2005)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.