Fabrication of large area 100 nm pitch grating by spatial frequency doubling and nanoimprint lithography for subwavelength optical applications

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2816-2819

  Yu, Zhaoning ^a   Wu, Wei ^a   Chen, Lei ^a   Chou, Stephen Y ^a  

^a Princeton University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BIREFRINGENCE; DIFFRACTION GRATINGS; ELLIPSOMETRY; INTERFEROMETRY; LITHOGRAPHY; OPTICAL VARIABLES MEASUREMENT; REFRACTIVE INDEX;

NANOIMPRINT LITHOGRAPHY; PITCH GRATING; SPATIAL FREQUENCY DOUBLING;

NANOTECHNOLOGY;

EID: 0035519821     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1409384     Document Type: Article

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