Microstructure characterization of multilayered TiSiN/CrN thin films

Journal of Nanoscience and Nanotechnology

Volumn 8, Issue 5, 2008, Pages 2688-2692

  Yang, Sheng Min ^a   Chang, Yin Yu ^b   Lin, Dong Yin ^c   Wang, Da Yung ^b   Wu, Weite ^b  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

^b MINGDAO UNIVERSITY   (Taiwan)

^c I SHOU UNIVERSITY   (Taiwan)

Author keywords

Amorphous silicon nitride; Cathodic arc evaporation; Multilayer coating; TiSiN CrN

Indexed keywords

CATHODE CURRENTS; CATHODE MATERIALS; CATHODIC ARC DEPOSITION; MICROSTRUCTURE CHARACTERIZATIONS; MULTI-LAYERED;

CATHODES; CHROMIUM; ENERGY ABSORPTION; LITHOGRAPHY; THICK FILMS; TITANIUM COMPOUNDS;

VAPOR DEPOSITION;

EID: 45849112915     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2008.592     Document Type: Conference Paper

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