Amorphous silicon nitride films of different composition deposited at room temperature by pulsed glow discharge plasma immersion ion implantation and deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 6, 2004, Pages 2342-2346

  Afanasyev Charkin, I V ^a   Jacobsohn, L G ^a   Averitt, R D ^a   Nastasi, M ^a  

^a LOS ALAMOS NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CORROSION RESISTANCE; ENERGY GAP; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GLOW DISCHARGES; HYDROGENATION; ION IMPLANTATION; LIGHT ABSORPTION; OXIDATION; RAMAN SPECTROSCOPY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON NITRIDE;

ELASTIC RECOIL DETECTION ANALYSIS; ROOM TEMPERATURE; UV-VISIBLE OPTICAL ABSORPTION;

AMORPHOUS FILMS;

EID: 10244227949     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1798731     Document Type: Article

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