Composition and optical properties of silicon oxynitride films deposited by electron cyclotron resonance

Vacuum

Volumn 67, Issue 3-4, 2002, Pages 507-512

  Del Prado, A ^a   San Andres E ^a   Martinez F L ^a   Martil I ^a   Gonzalez Diaz G ^a   Bohne, W ^b   Rohrich J ^b   Selle, B ^b   Fernandez M ^c  

^a UNIVERSIDAD COMPLUTENSE DE MADRID   (Spain)

^b HAHN MEITNER INSTITUT   (Germany)

^c INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

Author keywords

ECR; HI ERDA; Silicon oxynitride

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; COMPOSITION; ELECTRON CYCLOTRON RESONANCE; ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MIXTURES; REFRACTIVE INDEX; SILANES; SILICON NITRIDE;

STOICHIOMETRIC FILMS;

SEMICONDUCTING FILMS;

EID: 0037179738     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00220-8     Document Type: Conference Paper

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