Silicon nanotweezers with subnanometer resolution for the micromanipulation of biomolecules

Journal of Microelectromechanical Systems

Volumn 17, Issue 3, 2008, Pages 623-631

  Yamahata, Christophe ^a   Collard, Dominique ^b   Legrand, Bernard ^c   Takekawa, Tetsuya ^d,e   Kumemura, Momoko ^a   Hashiguchi, Gen ^f   Fujita, Hiroyuki ^a  

^a INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

^c INSTITUT D ELECTRONIQUE   (France)

^d KAGAWA UNIVERSITY   (Japan)

^e NTT CORPORATION   (Japan)

^f SHIZUOKA UNIVERSITY   (Japan)

Author keywords

Biomechanics; Dielectrophoresis (DEP); Differential capacitive sensor; DNA tweezers; Molecular biophysics; Silicon on insulator (SOI)

Indexed keywords

ASPECT RATIO; COMPUTER NETWORKS; DIMENSIONAL STABILITY; DNA; DYNAMICAL SYSTEMS; ELECTROMECHANICAL DEVICES; ELECTROSTATIC ACTUATORS; ETCHING; GENES; LITHOGRAPHY; MANIPULATORS; MECHANICS; MEMS; MICROELECTROMECHANICAL DEVICES; MOLECULAR BIOLOGY; MOLECULAR STRUCTURE; MOLECULES; NATURAL FREQUENCIES; NONMETALS; NUCLEIC ACIDS; ORGANIC ACIDS; PHOTORESISTS; Q FACTOR MEASUREMENT; REACTIVE ION ETCHING; SILICON; TECHNOLOGY;

(100) SILICON; CAPACITIVE SENSORS; DEEP REACTIVE ION ETCHING (DRIV); DNA MOLECULES; FABRICATION PROCESSES; HIGH-ASPECT RATIO MICROSTRUCTURES (HARMST); INITIAL GAP; MAXIMUM DISPLACEMENT; MICRO MANIPULATIONS; MICRO-ELECTRO- MECHANICAL SYSTEM (MEMS); NANO TWEEZERS; QUALITY FACTOR (Q FACTOR); RESONANT FREQUENCIES; SILICON ON INSULATOR (SOI) TECHNOLOGY; STATIC AND DYNAMIC; SUB-NANOMETER RESOLUTION; VISCOELASTIC BEHAVIORS; WET ANISOTROPIC ETCHING;

SILICON ON INSULATOR TECHNOLOGY;

EID: 45449097271     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2008.922080     Document Type: Article

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