Pellicle effect on OPC modeling

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Luo, Boren ^a   Chang, Chi Kang ^a   Wang, W L ^a   Huang, W C ^a   Wu, Timothy ^a   Lai, C W ^a   Liu, R G ^a   Lin, H T ^a   Chen, K S ^a   Ku, Y C ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

Aberration; Hyper NA lithography; Jones pupil; Mask pellicle; OPC model

Indexed keywords

CADMIUM; CADMIUM COMPOUNDS; LITHOGRAPHY; MODELS; NANOTECHNOLOGY; OPTICAL SYSTEMS; OPTICS; SODIUM; TELLURIUM COMPOUNDS;

CD VARIATIONS; DEFOCUS; DISTORTION (DEFORMATION); HIGH NA; HIGH-ORDER ABERRATIONS; IC MANUFACTURING; IMMERSION LITHOGRAPHY (IML); MASK TOPOGRAPHY; MODEL ACCURACY; OPC MODELING; OPTICAL MICRO LITHOGRAPHY; OPTICAL QUALITIES; PHASE VARIATIONS; PHYSICAL EFFECTS; WAVE COMPONENTS;

PHOTOACOUSTIC EFFECT;

EID: 45449094585     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.775419     Document Type: Conference Paper

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