Pupil plane analysis on AIMS™ 45-193i for advanced photomasks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 2, 2007, Pages

  Morikawa, Yasutaka ^a   Sutou, Takanori ^a   Mesuda, Kei ^a   Nagai, Takaharu ^a   Inazuki, Yuichi ^a   Adachi, Takashi ^a   Toyama, Nobuhito ^a   Mohri, Hiroshi ^a   Hayashi, Naoya ^a   Stroessner, Ulrich ^b   Birkner, Robert ^b   Richter, Rigo ^b   Scheruebl, Thomas ^b  

^a DAI NIPPON PRINTING CO LTD   (Japan)

^b CARL ZEISS SMT AG   (Germany)

Author keywords

45nm; AIMS ; Hyper NA; Optical characteristics; Pellicle; Photomask; Polarized illumination

Indexed keywords

COMPUTER SIMULATION; LIGHT POLARIZATION; LIGHTING; OPTICAL PROPERTIES; THICKNESS CONTROL;

OPTICAL CHARACTERISTICS; PELLICLE; POLARIZED ILLUMINATION;

PHOTOMASKS;

EID: 35148886326     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711664     Document Type: Conference Paper

References (5)

1. Masaki Yoshizawa, et al., "Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography", Proc. of SPIE Vol. 6283, 62831G, (2006)
2. Kazuya Sato, et al., "Hp45 lithography in consideration of the mask 3D effect", Proc. of SPIE Vol. 6283, 62831F, (2006)
3. Kevin Lucas, et al., "Optical issues of thin organic pellicles in 45nm and 32nm immersion lithography", Proc. of SPIE Vol. 6349, 63490K, (2006)
4. Takanori Suto, et al., "Diffraction efficiency analysis on AIMS™ 45-193i for advanced photomasks", 3rd International Symposium on Immersion Lithography, Oct. 2006.
5. Yasutaka Morikawa, et al., "Characteristics optimization of mask materials for Hyper-NA lithography", Proc. of SPIE Vol. 6533, to be published, (2007)