Pellicle induced aberration and apodization in hyper NA optical lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6283 I, Issue , 2006, Pages

  Bubke, Karsten ^a   Alles, Benjamin ^b   Cotte, Eric ^a   Sczyrba, Martin ^a   Pierrat, Christophe ^a  

^a Advanced Mask Technology Centre GmbH and Co KG   (Germany)

^b TECHNICAL UNIVERSITY OF MUNICH   (Germany)

Author keywords

Aberration; Apodization; CD uniformity; Hyper NA Lithography; Pellicle

Indexed keywords

ABERRATIONS; ERROR ANALYSIS; LIGHT POLARIZATION; OPTICAL INSTRUMENT LENSES; OPTICAL RESOLVING POWER;

APODIZATION; CD UNIFORMITY; HYPER NUMERICAL APERTURES (NA) LITHOGRAPHY; PELLICLES;

PHOTOLITHOGRAPHY;

EID: 33748076458     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.681871     Document Type: Conference Paper

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