Optical issues of thin organic pellicles in 45nm and 32nm immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6349 II, Issue , 2006, Pages

  Lucas, Kevin ^a,e   Gordon, Joseph S ^b   Conley, Will ^a   Saied, Mazen ^a   Warrick, Scott ^a   Pochkowski, Mike ^c   Smith, Mark D ^c   West, Craig ^b   Kalk, Franklin ^b   Kuijten, Jan Pieter ^d  

^a FREESCALE SEMICONDUCTOR INC   (United States)

^b Toppan Photomask   (United States)

^c KLA Tencor Austin   (United States)

^d ASML   (Netherlands)

^e SYNOPSYS INC   (United States)

Author keywords

Design rules; DRC; Lithography; Model based physical verification; OPC; RET

Indexed keywords

DIFFRACTIVE OPTICS; MASKS; MATHEMATICAL MODELS; OPTICAL VARIABLES CONTROL; OPTIMIZATION; THIN FILMS;

DESIGN RULES; DRC; MODEL BASED PHYSICAL VERIFICATION; OPC; RET;

PHOTOLITHOGRAPHY;

EID: 33846627341     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.686741     Document Type: Conference Paper

References (4)

1. Peter DeBischop, et. al. Initial assessment of the lithographic impact of the use of hard pellicles; an overview. Proceedings of SPIE, Vol. 5377, 2004.
2. Chris Progler. The optics of photomasks, from shadowy past to scattered future. Keynote speech at the SPIE Microlithography Conference, conference #6154, Feb. 21, 2006.
3. Bruce Smith, Hoyoung Kang. Spatial frequency filtering in the pellicle plane. Proceedings of SPIE, Vol. 4000, 2000.
4. Sergei Postnikov, et. al. CD error budget analysis for 0.18-um inlaid trench lithography. Proceedings of SPIE, Vol. 3677, 1999.