Impact of mask pellicle effects to OPC quality

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6607, Issue PART 1, 2007, Pages

  Koop, Hans ^a   Schmoeller, Thomas ^a   Cheng, Wen Hao ^a  

^a Synopsys GmbH   (Germany)

Author keywords

Hyper NA lithography; OPC; Pellicle apodization

Indexed keywords

COMPUTER SIMULATION; MASKS; NUMERICAL METHODS; PHOTOLITHOGRAPHY; TOPOGRAPHY;

HYPER NA LITHOGRAPHY; OPTICAL PROXIMITY CORRECTION (OPC); PELLICLE APODIZATION;

OPTICAL SYSTEMS;

EID: 36249015405     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.728937     Document Type: Conference Paper

References (9)

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9. J.S. Gorgon et al., "Method for using a coated fluoropolymer substrate pellicle in semiconductor fabrication", US Patent 6586159,2003.