OPC modeling by genetic algorithm

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 2, 2005, Pages 1229-1240

  Huang, W C ^a   Lai, C M ^a   Luo, B ^a   Tsai, C K ^a   Tsay, C S ^a   Lai, C W ^a   Kuo, C C ^a   Liu, R G ^a   Lin, H T ^a   Lin, B J ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

Diffused aerial image model; Genetic algorithm; Optical proximity correction; Optimization

Indexed keywords

IMAGE ANALYSIS; MASKS; MATHEMATICAL MODELS; NUMERICAL METHODS; OPTICAL SYSTEMS; OPTIMIZATION; PARAMETER ESTIMATION; PHOTOLITHOGRAPHY; REGRESSION ANALYSIS;

DIFFUSED AERIAL IMAGE MODEL; OPTICAL KERNELS; OPTICAL PROXIMITY CORRECTION (OPC); REGRESSION PARAMETERS;

GENETIC ALGORITHMS;

EID: 25144514884     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.602096     Document Type: Conference Paper

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