Key technologies for high density FeRAM applications

Integrated Ferroelectrics

Volumn 48, Issue , 2002, Pages 127-137

  Nagel, N ^a   Kunishima, I ^b  

^a CENTER FOR DRUG EVALUATION AND RESEARCH   (United States)

^b TOSHIBA CORPORATION   (Japan)

Author keywords

Chain cell; FeRAM; Ferroelectric; Hydrogen barrier

Indexed keywords

CAPACITORS; CMOS INTEGRATED CIRCUITS; CRYSTALLIZATION; FERROELECTRIC DEVICES; HYDROGEN;

CHAIN CELL; CHAIN CELL ARCHITECTURE; FERAM; HYDROGEN BARRIER;

RANDOM ACCESS STORAGE;

EID: 4544275796     PISSN: 10584587     EISSN: 16078489     Source Type: Conference Proceeding    
DOI: 10.1080/10584580215459     Document Type: Article

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