A novel wet etching process of Pb(Zr,Ti)O3 thin films for applications in microelectromechanical system

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 6 B, 2004, Pages 3934-3937

  Zheng, Kelu ^a   Lu, Jian ^a   Chu, Jiaru ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

MEMS; PZT; Thin film; Wet etching

Indexed keywords

ETCHING RATES; PB(ZR,TI)O3 (PZT); WET ETCHING;

DRY ETCHING; ENERGY DISPERSIVE SPECTROSCOPY; INDUCTIVELY COUPLED PLASMA; MICROELECTROMECHANICAL DEVICES; PHOTORESISTS; REACTIVE ION ETCHING; SOL-GELS; X RAY DIFFRACTION;

THIN FILMS;

EID: 4444331580     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.3934     Document Type: Conference Paper

References (18)

1. P. Muralt: IEEE Ttrans. Ultrason. Ferroelectr. Freq. Control 47 (2000) 903.
2. K. Kunz, P. Enoksson and G. Stemme: Sens. & Actual. A 92 (2001) 156.
3. J. Chu, J. Lu, Y. Wu, W. Huang, R. Maeda, T. Itoh and T. Suga: Proc. SPIE 4601 (2001) 379.
4. T. Itoh, C. Lee, J. Chu and T. Suga: Proc. IEEE 10th Annu. Int. Workshop MEMS'97 (IEEE, New Jersey, 1997) p. 78.
5. M. Hendrickson, S. Tao, S. Trolier-McKinstry, B. J. Rod and R. J. Zeto: Proc. 10th IEEE Int. Symp. Appl. Ferroelectr. '96 2 (IEEE, East Brunswick, 1996) p. 683.
6. R. Zeto, B. Rod, M. Dubey, M. Ervin, J. Conrad, R. Piekarz, S. Trolier-McKinstry, T. Su and J. Shepard: Materials Research Society Symp. Proc. 546 (1999) 159.
7. K. Saito, J. H. Choi, T. Fukuda and M. Ohue: Jpn. J. Appl. Phys. 31 (1992) L1260.
8. X. Li, K. Yamashita, T. Tanaka and Y. Suzuki: Sens. & Actual. A 82 (2000) 265.
9. P. Werbaneth, J. Almerico, L. Jerde and S. Marks: Advanced Semiconductor Manufacturing 2002 IEEE/SEMI Conf. & Workshop (IEEE, Boston, 2002) p. 177.
10. J. J. Van Glabbeek, G. A. C. M. Spierings, M. J. E. Ulenaers, G. J. M. Dormans and P. K. Larsen: Materials Research Society Symp. Proc. 310 (1993) 127.
11. D. P. Vijay, S. B. Desu and W. Pan: J. Electrochem. Soc. 140 (1993) 2635.
12. M. G. Kang, K. T. Kim and C. I. Kim: Thin Solid Films 398-399 (2001) 448.
13. C. W. Chung, W. I. Lee and J. K. Lee: Integr. Ferroelectr. 11 (1995) 259.
14. S. Yokoyama, Y. Ito, K. Ishihara, K. Hamada, S. Ohnishi, J. Kudo and K. Sakiyama: Jpn. J. Appl. Phys. 34 (1995) 767.
15. S. Mancha: Ferroelectrics 135 (1992) 131.
16. R. A. Miller and J. J. Bernstein: Integr. Ferroelectr. 29 (2000) 225.
17. L. P. Wang, R. Wolf, Q. Zhou, S. Trolier-McKinstry and R. J. Davis: Materials Research Society Symp. Proc. 657 (2001) EE 5391.
18. J. Lu and J. Chu: J. Univ. Sci. & Technol. China 32 (2002) 748 [in Chinese].