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Volumn 43, Issue 6 B, 2004, Pages 4017-4021
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Sub-100-nm photolithography based on plasmon resonance
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Author keywords
Nanolithography; Near field optics; Photolithography; Plasmon resonance; Subwavelength resolution
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Indexed keywords
COMPUTER SIMULATION;
ELECTRIC FIELDS;
INTERFEROMETRY;
ION BEAM LITHOGRAPHY;
NANOTECHNOLOGY;
PHASE SHIFT;
PHOTORESISTS;
QUANTUM THEORY;
SURFACE PLASMON RESONANCE;
VECTORS;
NEAR-FIELD OPTICS;
PLASMON RESONANCE;
QUANTUM DEVICES;
SUBWAVELENGTH RESOLUTION;
PHOTOLITHOGRAPHY;
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EID: 4444250632
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/JJAP.43.4017 Document Type: Conference Paper |
Times cited : (36)
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References (23)
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