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Volumn 43, Issue 6 B, 2004, Pages 4017-4021

Sub-100-nm photolithography based on plasmon resonance

Author keywords

Nanolithography; Near field optics; Photolithography; Plasmon resonance; Subwavelength resolution

Indexed keywords

COMPUTER SIMULATION; ELECTRIC FIELDS; INTERFEROMETRY; ION BEAM LITHOGRAPHY; NANOTECHNOLOGY; PHASE SHIFT; PHOTORESISTS; QUANTUM THEORY; SURFACE PLASMON RESONANCE; VECTORS;

EID: 4444250632     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.4017     Document Type: Conference Paper
Times cited : (36)

References (23)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.