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Volumn 15, Issue 15, 1996, Pages 1340-1342
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Properties of Zr-N thin films prepared by the ion and vapour deposition method
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Author keywords
[No Author keywords available]
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Indexed keywords
BINDING ENERGY;
CALCULATIONS;
CARRIER CONCENTRATION;
CHEMICAL VAPOR DEPOSITION;
CRYSTAL STRUCTURE;
EVAPORATION;
FILM PREPARATION;
NITRIDES;
SPUTTERING;
STOICHIOMETRY;
X RAY CRYSTALLOGRAPHY;
X RAY PHOTOELECTRON SPECTROSCOPY;
ATOMIC BINDING;
CHARGE STATE DISTRIBUTION;
COMPOSITION ANALYSIS;
CRITICAL LOAD MEASUREMENT;
ELECTRON BEAM EVAPORATOR;
KNOOP HARDNESS;
PREFERENTIAL REJECTION OF NITROGEN;
ZIRCONIUM NITRIDES;
THIN FILMS;
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EID: 0030214930
PISSN: 02618028
EISSN: None
Source Type: Journal
DOI: 10.1007/BF00240801 Document Type: Article |
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Times cited : (3)
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References (13)
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