Compositional uniformity in sputter-deposited NiTi shape memory alloy thin films

Materials Letters

Volumn 62, Issue 20, 2008, Pages 3481-3483

  Mohanchandra, K P ^a   Ho, Ken K ^b   Carman, Greg P ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b Fortis Technologies   (United States)

Author keywords

Shape memory materials; Thin films

Indexed keywords

MAGNETRON SPUTTERING; NICKEL COMPOUNDS; SHAPE MEMORY EFFECT; SPUTTER DEPOSITION;

COMPOSITIONAL UNIFORMITY; TARGET COMPOSITION; TARGET CONDITION;

THIN FILMS;

EID: 44349114999     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2008.03.028     Document Type: Article

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