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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 12, 2001, Pages 6936-6940

Dependence of composition distribution of NiTi sputtered films on Ar gas pressure

(7) Yamazaki, Toshinari a Yoshizawa, Toshio a Takada, Hisatoshi a Takeda, Fumio a,b Kikuta, Toshio a Nakatani, Noriyuki a Yamabuchi, Tatsuo a

a UNIVERSITY OF TOYAMA (Japan)

b TOYAMA NATIONAL COLLEGE OF TECHNOLOGY (Japan)

Author keywords

Composition uniformity; Monte Carlo method; NiTi; Shape memory alloy; Sputtering; Thin film

Indexed keywords

ARGON; ATOMS; COMPOSITION EFFECTS; COMPUTER SIMULATION; MAGNETRON SPUTTERING; MONTE CARLO METHODS; NICKEL; SCATTERING; SHAPE MEMORY EFFECT; SUBSTRATES; THIN FILMS; TITANIUM;

ANGULAR DISTRIBUTION; ARGON GAS PRESSURE; COMPOSITION DISTRIBUTION; COMPOSITION UNIFORMITY; NICKEL TITANIUM SPUTTERED FILM;

NICKEL ALLOYS;

EID: 0035712048 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.40.6936 Document Type: Article

Times cited : (6)

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