Effect of magnetic field configuration on the properties of thin films sputter deposited from a dc magnetron TiNi target

Journal De Physique. IV : JP

Volumn 112 II, Issue , 2003, Pages 845-848

  Martynov, V ^a   Johnson, A D ^a   Gupta, V ^a  

^a TiNi Alloy Company   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MAGNETIC FIELD EFFECTS; MAGNETRON SPUTTERING; SHAPE MEMORY EFFECT; SPUTTER DEPOSITION; STRAIN; STRESS ANALYSIS; TEMPERATURE; THIN FILMS;

STATIONARY PALLET; TITANIUM NICKEL ALLOYS; TRANSFORMATION TEMPERATURE;

TITANIUM ALLOYS;

EID: 0242456373     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:20031013     Document Type: Conference Paper

References (3)

1. J.L. Vossen, W. Kern (eds.), Thin Film Processes, Academic Press, 1978
2. J.D. Busch, A.D. Johnson, C.H. Lee, and D.A. Stevenson, J. Appl. Phys. 12 (1990) 6224.
3. J.D. Busch, A.D. Johnson "Prototype micro-valve actuator", Micro Electro Mechanical Systems Workshop, Napa Valley, 1990, pp. 40-41.