Growth and characterization of TixNi1-x shape memory thin films using simultaneous sputter deposition from separate elemental targets

Thin Solid Films

Volumn 491, Issue 1-2, 2005, Pages 190-196

  Sanjabi, Sohrab ^a,b   Sadrnezhaad, Sayed K ^b   Yates, Karen A ^a   Barber, Zoe H ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b SHARIF UNIVERSITY OF TECHNOLOGY   (Iran)

Author keywords

Shape memory alloy; Sputtering; TiNi; X ray diffraction

Indexed keywords

CRYSTALLIZATION; ENERGY DISPERSIVE SPECTROSCOPY; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; THIN FILMS; TITANIUM NITRIDE; X RAY SPECTROSCOPY;

AR GAS PRESSURE; ELEMENTAL TARGETS; FILM COMPOSITION; TINI;

SHAPE MEMORY EFFECT;

EID: 25144488343     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.06.004     Document Type: Article

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