Investigation of sub-nm ALD aluminum oxide films by plasma assisted etch-through

Thin Solid Films

Volumn 516, Issue 16, 2008, Pages 5551-5556

  Grigoras, K ^a   Franssila, S ^a   Airaksinen, V M ^a  

^a Department of Electrical and Communications Engineering   (Finland)

Author keywords

Aluminum oxide; Atomic force microscopy; Atomic layer deposition; Plasma etching; Scanning electron microscopy; Ultra thin layer

Indexed keywords

ATOMIC FORCE MICROSCOPY; ATOMIC LAYER DEPOSITION; CRYOGENICS; OXIDE FILMS; PLASMA ETCHING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING ALUMINUM COMPOUNDS; SILICON COMPOUNDS;

ALUMINUM OXIDE ETCH RATES; ALUMINUM OXIDE FILMS;

ULTRATHIN FILMS;

EID: 43949139906     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.07.121     Document Type: Article

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