PYRAMID - A hierarchical, rule-based approach toward proximity effect correction - Part I: Exposure estimation

IEEE Transactions on Semiconductor Manufacturing

Volumn 11, Issue 1, 1998, Pages 108-116

  Lee, Soo Young ^a,b   Cook, Brian D ^c  

^a IEEE   (United States)

^b AUBURN UNIVERSITY   (United States)

^c CHARLES STARK DRAPER LABORATORY   (United States)

Author keywords

Cumulative distribution function; Electron beam lithography; Exposure estimation; Global exposure; Local exposure; Proximity effect correction

Indexed keywords

COMPUTATIONAL COMPLEXITY; COMPUTER SIMULATION; DIGITAL SIGNAL PROCESSING; ELECTRON SCATTERING; ESTIMATION; INTEGRATED CIRCUIT LAYOUT; MATHEMATICAL MODELS;

CIRCUIT PATTERN; CUMULATIVE DISTRIBUTION FUNCTION; HIERARCHICAL ESTIMATION TECHNIQUE; PROXIMITY EFFECT CORRECTION SCHEME;

ELECTRON BEAM LITHOGRAPHY;

EID: 0032002956     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (11)

1. D. P. Kern, "A novel approach to proximity effect correction," in Proc. 9th Int. Conf. Electron and Ion Beam Science and Technology, R. Bakish, Ed. Princeton, NJ: Electrochem. Soc., 1980, pp. 326-339.
2. J. S. Greeneich, "Proximity effect correction using a dose compensation curve," J. Vac. Sci. Technol., vol. 19, no. 4, pp. 1269-1274, Nov.-Dec. 1981.
3. M. Parikh, "Corrections to proximity effects in electron beam lithography. II. Implementation," J. Appl. Phys., vol. 50, no. 6, pp. 4378-4382, June 1979.
4. _, "Corrections to proximity effects in electron beam lithography. III. Experiments," J. Appl. Phys., vol. 50, no. 6, pp. 4383-4387, June 1979.
5. M. Parikh, "Proximity effect corrections in electron beam lithography," in Proc. 8th Int. Conf. Electron and Ion Beam Science and Technology, R. Bakish, Ed. Princeton, NJ: Electrochem. Soc., 1978, vol. 8, pp. 382-391.
6. H. Eisenmann, T. Waas, and H. Hartmann, "PROXECCO - Proximity effect correction by convolution," J. Vac. Sci. Technol., vol. B11, no. 6, pp. 2741-2745, Nov.-Dec. 1993.
7. J. C. Jacob, S.-Y. Lee, J. A. McMillan, and N. C. MacDonald, "Fast proximity effect correction: An extension of PYRAMID for circuit patterns of arbitrary size," J. Vac. Sci. Technol., vol. B10, no. 6, pp. 3077-3082, Nov.-Dec. 1992.
8. S.-Y. Lee and B. D. Cook, "Interior area removal method for PYRAMID," J. Vac. Sci. Technol., vol. B12, no. 6, pp. 3449-3454, Nov.-Dec. 1994.
9. B. D. Cook and S.-Y. Lee, "Fast proximity effect correction: An extension of PYRAMID for thicker resists," J. Vac. Sci. Technol., vol. B11, no. 6, pp. 2673-2676, Nov.-Dec. 1993.
10. T. H. P. Chang, "Proximity effect in electron-beam lithography," J. Vac. Sci. Technol., vol. 12, no. 6, pp. 1271-1275, Nov.-Dec. 1975.
11. S. Johnson, "Simulation of electron scattering in complex nanostructures Lithography, metrology, and characterization," Ph.D. dissertation, Cornell University, Ithaca, NY, Jan. 1992.