An efficient proximity-effect correction method for electron-beam patterning of photonic-crystal devices

Microelectronic Engineering

Volumn 67-68, Issue , 2003, Pages 182-188

  Wuest R ^a   Strasser, P ^a   Jungo, M ^a   Robin, F ^a   Erni, D ^a   Jackel H ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

Electron beam lithography; Photonic crystal; Proximity effect correction

Indexed keywords

BAND STRUCTURE; ELECTRIC POTENTIAL; ELECTRON BEAMS; PHOTONS;

PROXIMITY-EFFECT CORRECTION;

CRYSTALS;

EID: 0038020980     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00070-4     Document Type: Conference Paper

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