Accuracy and efficiency in electron beam proximity effect correction

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3262-3268

  Wind, S J ^a   Gerber, P D ^b   Rothuizen, H ^c  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b Gerber Analytics   (United States)

^c IBM RESEARCH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012675720     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590361     Document Type: Article

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