Microcolumn based low energy e-beam writing

Microelectronic Engineering

Volumn 30, Issue 1-4, 1996, Pages 45-48

  Stebler, C ^a   Despont, M ^a   Staufer, U ^a   Chang, T H P ^b   Lee, K Y ^b   Rishton, S A ^b  

^a IBM RESEARCH ZURICH   (Switzerland)

^b IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRONS; MONOLAYERS; OPTICAL MICROSCOPY; PASSIVATION; PHOTORESISTS; POLYMETHYL METHACRYLATES; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; THIN FILMS;

ELECTRON BEAM WRITING; MICROCOLUMN; PROXIMITY EFFECTS; SELF ASSEMBLED MONOLAYERS; SPIN COATING;

ELECTRON BEAM LITHOGRAPHY;

EID: 0029771105     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00191-3     Document Type: Article

References (7)

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