Thickness and composition of ultrathin SiO2 layers on Si

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 4, 2004, Pages 1572-1578

  Van Der Marel, C ^a   Verheijen, M A ^a   Tamminga, Y ^a   Pijnenburg, R H W ^b   Tombros, N ^c   Cubaynes, F ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^c UNIVERSITY OF GRONINGEN   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

MODEL ANALYSIS; OPTICAL THICKNESS; PARTICLE BEAM INTENSITY;

AMORPHOUS SILICON; CHEMICAL ANALYSIS; COMPOSITION; ELECTRON ENERGY LOSS SPECTROSCOPY; OXIDATION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SUBSTRATES; THICKNESS MEASUREMENT; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

ULTRATHIN FILMS;

EID: 4344695706     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1701864     Document Type: Conference Paper

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