Functional profile coatings and film stress

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 4, 2004, Pages 1610-1614

  Liu, Chian ^a   Conley, R ^a   Macrander, A T ^a  

^a ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPTICAL MIRRORS; FILM STRESSES; PROFILE-COATING TECHNIQUES; SUBPICOSECOND PARTICLE SOURCES (SPPS);

ABERRATIONS; ELECTRIC DISCHARGES; GOLD; LIGHT SOURCES; MAGNETRON SPUTTERING; MIRRORS; MULTILAYERS; POLISHING; SILICON WAFERS; SPUTTER DEPOSITION; STRESSES; SUBSTRATES; THICKNESS MEASUREMENT; THIN FILMS;

COATING TECHNIQUES;

EID: 4344620010     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1701863     Document Type: Conference Paper

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