In situ spectroscopic ellipsometry as a surface-sensitive tool to probe thin film growth

Thin Solid Films

Volumn 355, Issue , 1999, Pages 41-48

  Liu, Chian ^a   Erdmann, J ^a   Macrander, A ^a  

^a ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETRY; FILM GROWTH; MIRRORS; MORPHOLOGY; PROBES; SILICON WAFERS; SPECTROSCOPIC ANALYSIS; SPUTTER DEPOSITION; SURFACE ROUGHNESS; THICKNESS MEASUREMENT; THIN FILMS; X RAY SCATTERING;

MULTILAYER X RAY MIRRORS;

OPTICAL FILMS;

EID: 0033336868     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00441-1     Document Type: Article

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