Formation of embedded patterns in glasses using femtosecond irradiation

Applied Physics A: Materials Science and Processing

Volumn 79, Issue 4-6, 2004, Pages 1549-1553

  Juodkazis, S ^a,b   Yamasaki, K ^a   Mizeikis, V ^a   Matsuo, S ^a   Misawa, M ^b,c  

^a UNIVERSITY OF TOKUSHIMA   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c HOKKAIDO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ANNEALING; CHEMICAL BONDS; CRYSTALLIZATION; DIELECTRIC DEVICES; ETCHING; IRRADIATION; LITHIUM; MICROELECTROMECHANICAL DEVICES; MICROSTRUCTURE; SILICATE MINERALS; STRESS CORROSION CRACKING;

EMBEDDED PATTERNS; FEMTOSECOND IRRADIATION; PHOTOMODIFICATION; WET ETCHING;

PHOTOSENSITIVE GLASS;

EID: 4344583327     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-004-2845-1     Document Type: Conference Paper

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