Microfabrication by a high fluence femtosecond exposure: Mechanism and applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4637, Issue , 2002, Pages 159-168

  Watanabe, Mitsuru ^a   Juodkazis, Saulius ^a   Nishii, Junji ^b   Matsuo, Shigeki ^a   Misawa, Hiroaki ^a  

^a UNIVERSITY OF TOKUSHIMA   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Dielectric breakdown; Direct laser writing; Light induced damage threshold; Microfabrication; Silica; Two plasmon decay instability

Indexed keywords

CHARGE CARRIERS; DIELECTRIC MATERIALS; ELECTRIC BREAKDOWN; IRRADIATION; LASER ABLATION; MICROSTRUCTURE; ULTRASHORT PULSES;

DIRECT LASER WRITING;

MICROELECTRONIC PROCESSING;

EID: 0036406734     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.470618     Document Type: Article

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