Microstructuring of silica and polymethylmethacrylate glasses by femtosecond irradiation for MEMS applications

Materials Research Society Symposium - Proceedings

Volumn 687, Issue , 2002, Pages 173-178

  Juodkazis, Saulius ^a   Yamasaki, Kazuhiko ^a   Marcinkevičius, Andrius ^a   Mizeikis, Vygantas ^a   Matsuo, Shigeki ^a   Misawa, Hiroaki ^a   Lippert, Thomas ^a  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CRYSTAL MICROSTRUCTURE; ETCHING; FUSED SILICA; IRRADIATION; POLYMERIC GLASS; SEMICONDUCTOR DEVICE MANUFACTURE; THREE DIMENSIONAL; ULTRAFAST PHENOMENA;

CHEMICAL WET ETCHING; FEMTOSECOND IRRADIATION; FEMTOSECOND LASER MICROFABRICATION; HIGH ASPECT RATIO CHANNEL LIKE MICROSTRUCTURE; INTERCONNECTED NETWORKS;

MICROELECTROMECHANICAL DEVICES;

EID: 0036353769     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (8)