Fabrication of 3D interconnected network of micro-channels inside silica by femtosecond irradiation and etching

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4274, Issue , 2001, Pages 469-477

  Marcinkevičius, Andrius ^a   Juodkazis, Saulius ^a,c   Mizeikis, Vygantas ^a,c   Watanabe, Mitsuru ^a   Matsuo, Shigeki ^a   Nishii, Junji ^b   Misawa, Hiroaki ^a  

^a UNIVERSITY OF TOKUSHIMA   (Japan)

^b OSAKA NATIONAL RESEARCH INSTITUTE   (Japan)

^c VILNIUS UNIVERSITY   (Lithuania)

Author keywords

Femtosecond microfabrication; HF etching; Light induced damage threshold; Microexplosion; Silica

Indexed keywords

ASPECT RATIO; ETCHING; GLASS; LASER APPLICATIONS; LASER PULSES; LIGHT TRANSMISSION; MICROANALYSIS; MICROELECTRONICS; MICROFABRICATION; NITRIC ACID;

FEMTOSECOND IRRADIATION; FEMTOSECONDS; FOCUSED FEMTOSECOND LASERS; HF ETCHING; LIGHT-INDUCED; MICRO EXPLOSION; OPTICAL CHARACTERIZATION; THREE-DIMENSIONAL (3D) MICROFABRICATION;

SILICA;

EID: 33746922831     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.432543     Document Type: Conference Paper

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