Mechanism of the reduction of electron shading charge build-up using pulsed plasma

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 2 A, 2002, Pages 856-859

  Sumiya, Masahiro ^a   Tamura, Hitoshi ^a   Watanabe, Seiichi ^a  

^a HITACHI LTD   (Japan)

Author keywords

Electron shading; Etching; Pulse plasma; Semiconductor

Indexed keywords

ELECTRIC POTENTIAL; ELECTRODES; ELECTRONS; ETCHING; MICROPROCESSOR CHIPS; MICROWAVES;

ELECTRON SHADING; PULSED PLASMA;

PLASMA APPLICATIONS;

EID: 0036478374     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.856     Document Type: Article

References (9)