|
|
Volumn 38, Issue 7 B, 1999, Pages 4280-4282
|
|
Plasma properties of a negative ion plasma reactive ion etching system
|
|
Author keywords
[No Author keywords available]
|
|
Indexed keywords
ASPECT RATIO;
ELECTRIC CHARGE;
MAGNETIC FILTERS;
MICROELECTRONICS;
NEGATIVE IONS;
PLASMA DENSITY;
SEMICONDUCTOR PLASMAS;
TEMPERATURE;
ASPECT RATIO CHARGING EFFECTS;
ELECTRON TEMPERATURE;
HIGH DENSITY PLASMA;
INDUCTIVELY COUPLED PLASMA;
REACTIVE ION ETCHING;
|
|
EID: 0033157458
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.38.4280 Document Type: Article |
|
Times cited : (1)
|
|
References (11)
|
