Dynamic tuning of chemical-mechanical planarization operation via sliding-mode theory

Microelectronic Engineering

Volumn 75, Issue 3, 2004, Pages 285-296

  Lin, Chia Shui ^a   Chi, Chien Yu ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

Chemical mechanical planarization; Dishing; Dynamic tuning

Indexed keywords

CHEMICAL-MECHANICAL PLANARIZATION (CMP); DISHING; DYNAMIC TUNING; MULTI-STAGE POLISHING;

ALUMINUM ALLOYS; CAPACITANCE; COMPUTER SIMULATION; CONTROL SYSTEMS; COPPER; CURRENT DENSITY; ELECTRIC RESISTANCE; ELECTRIC WIRING; INTEGRATED CIRCUITS; POLISHING; REDUCTION; SLIDING MODE CONTROL;

MICROELECTRONICS;

EID: 4344564105     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.05.014     Document Type: Article

References (22)

1. Texas Engineering Extension Service (TEEX), CMP, TEEX, 2001.
2. T. Matsuda, H. Takahashi, M. Tsurugaya, K. Miyazaki, T.K. Doy, M. Kinoshita, J. Electrochem. Soc. 150 (9) (2003) G532-G536.
3. Y. Ein-Eli, E. Abelev, E. Rabkin, D. Starosvetsky, J. Electrochem. Soc. 150 (9) (2003) C646-C652.
4. Q. Luo, S. Ramarajan, S.V. Babu, Thin Solid Films 335 (1998) 160-167.
5. Y. Lin, Solid State Technol. 43 (6) (2000) 111-121.
6. Y.-C. Kao, C.-C. Yu, S.-H. Shen, Microelectron. Eng. 65 (2003) 61-75.
7. J.M. Steigerwald, S.P. Murarka, R.J. Gutmann, Chemical Mechanical Planarization of Microelectronic Materials, Wiley, New York, 1997.
8. G. Fu, A. Chandra, IEEE Trans. Semiconduct. Manufact. 16 (3) (2003) 477-485.
9. V. Nguyen, H. VanKranenburg, P. Woerlee, Microelectron. Eng. 50 (2000) 403-410.
10. X. Wang, H. Wang, Y. Liu, in: Proceedings of the 6th International Conference on Solid-State and Integrated-Circuit Technology, 2001, pp. 369-371.
11. J.M. Steigerwald, S.P. Murarka, R.J. Gutmann, D.J. Duquette, J . Vac. Sci. Technol. B 13 (6) (1995) 2215-2218.
12. J.-B. Chiu, C.-C. Yu, S.-H. Shen, Microelectron. Eng. 65 (2003) 345-356.
13. John Y. Hung, Weibing Gao, James C. Hung, IEEE Trans. Ind. Electron. 40 (1) (1993) 2-22.
14. S. Pan, H. Su, X. Hu, J. Chu, in: Proceedings of the 3rd World Congress on Intelligent Control and Automation, 2000, pp. 2977-2981.
15. L. Da, V.G. Kumar, A. Tay, A.A. Mamun, W.K. Ho, A. See, L. Chan, in: Proceedings of the 2002 IEEE International Symposium on Intelligent Control, 2002, pp. 740-745.
16. Y.-P. Chen, J.-L. Chang, Design of Variable Structure System (Chinese version), second ed., Chuan Hua, Taipei, 2002.
17. Y.-P. Chen, J.-L. Chang, Int. J. Sys. Sci. 31 (4) (2000) 417-420.
18. K. Wijekoon, S. Tsai, M. Chandrachood, B. Brown, F. Redeker, S. Nanjangud, G. Amico, SEMI/Japan Technical Symposium, 1998.
19. Y.-C. Kao, C.-C. Yu, S.-H. Shen, Microelectron. Eng. 65 (2003) 61-75.
20. V.H. Nguyen, P. van der Velden, R. Daamen, H. van Kranenburg, P.H. Woerlee, IEDM Technical Digest. (2000) 499-502.
21. J. Luo, D.A. Dornfeld, IEEE Trans. Semiconduct. Manufact. 14 (2) (2001) 112-132.
22. V.H. Nguyen, R. Daamen, H. van Kranenburg, P. van der Velden, P.H. Woerlee, J. Electrochem. Soc. 150 (11) (2003) G689-G693.