Modelling of dishing for metal chemical mechanical polishing

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 2000, Pages 499-501

  Nguyen, Viet H ^a   Van der Velden, P ^b   Daamen, R ^b   Van Kranenburg, H ^a   Woerlee, Pierre H ^a,b  

^a UNIVERSITY OF TWENTE   (Netherlands)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE; MODELS; SEMICONDUCTOR DEVICE MODELS; SILICON WAFERS; WSI CIRCUITS;

DISHING; WAFER CONTACT;

CHEMICAL MECHANICAL POLISHING;

EID: 0034453544     PISSN: 01631918     EISSN: None     Source Type: Journal    
DOI: 10.1109/IEDM.2000.904364     Document Type: Article

References (7)