Run-to-run process control for chemical mechanical polishing in semiconductor manufacturing

IEEE International Symposium on Intelligent Control - Proceedings

Volumn , Issue , 2002, Pages 740-745

  Da, Li ^a   Kumar, Varadarajan Ganesh ^a   Tay, Arthur ^a   Al Mamun, Abdullah ^a   Ho, Weng Khuen ^a   See, Alex ^b   Chan, Lap ^b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b CHARTERED SEMICONDUCTOR MANUFACTURING LTD   (Singapore)

Author keywords

Chemical mechanical polishing; Exponentially weighted moving average; Run to run (R2R) control; Semiconductor manufacturing

Indexed keywords

CHEMICAL MECHANICAL POLISHING; COMPUTER SIMULATION; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS;

PREDICTOR CORRECTOR CONTROLLER; RUN TO RUN CONTROL;

PROCESS CONTROL;

EID: 0036912089     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (18)

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