Characterization of W-O coatings deposited by magnetron sputtering with reactive gas pulsing

Surface and Coatings Technology

Volumn 201, Issue 9-11 SPEC. ISS., 2007, Pages 5481-5486

  Parreira, N M G ^a   Polcar, T ^a   Cavaleiro, A ^a  

^a UNIVERSITY OF COIMBRA   (Portugal)

Author keywords

Gas pulsing; Multilayer structure; Reactive sputtering; Structural characterization; Tungsten oxide

Indexed keywords

COMPOSITION; HARDNESS; MAGNETRON SPUTTERING; MICROSTRUCTURE; MORPHOLOGY; MULTILAYERS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; TUNGSTEN COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

ELECTRON PROBE MICROANALYSIS; MULTILAYER STRUCTURE; REACTIVE SPUTTERING; TUNGSTEN OXIDE;

INORGANIC COATINGS;

COMPOSITION; HARDNESS; INORGANIC COATINGS; MAGNETRON SPUTTERING; MICROSTRUCTURE; MORPHOLOGY; MULTILAYERS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; TUNGSTEN COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

EID: 33846552988     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.07.017     Document Type: Article

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