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Volumn 76, Issue 2, 2000, Pages 107-115
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Effect of oxygen on residual stress and structural properties of tungsten nitride films grown by reactive magnetron sputtering
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Author keywords
Oxygen; Reactive magnetron sputtering; Residual stress; Structural properties; Tungsten nitride films
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Indexed keywords
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EID: 0347740311
PISSN: 09215107
EISSN: None
Source Type: Journal
DOI: 10.1016/S0921-5107(00)00424-4 Document Type: Article |
Times cited : (22)
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References (24)
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