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Volumn 76, Issue 2, 2000, Pages 107-115

Effect of oxygen on residual stress and structural properties of tungsten nitride films grown by reactive magnetron sputtering

Author keywords

Oxygen; Reactive magnetron sputtering; Residual stress; Structural properties; Tungsten nitride films

Indexed keywords


EID: 0347740311     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(00)00424-4     Document Type: Article
Times cited : (22)

References (24)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.