Photoreflectance study of AIN thin films grown by reactive gas-timing rf magnetron sputtering

International Journal of Modern Physics B

Volumn 16, Issue 28-29, 2002, Pages 4418-4422

  Kietipaisalsophon, N ^a   Bunjongpru, W ^a   Nukeaw, J ^a  

^a KING MONGKUT'S INSTITUTE OF TECHNOLOGY LADKRABANG   (Thailand)

Author keywords

[No Author keywords available]

Indexed keywords

CONFERENCE PAPER; ENERGY; FILM; FLOW RATE; GAS; MICROWAVE OVEN; REFLECTOMETRY; ROOM TEMPERATURE; STRUCTURE ANALYSIS; TECHNIQUE; X RAY DIFFRACTION;

EID: 0037146205     PISSN: 02179792     EISSN: None     Source Type: Journal    
DOI: 10.1142/s0217979202015522     Document Type: Conference Paper

References (8)

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