High rate deposition of transparent conducting oxide thin films by vacuum arc plasma evaporation

Thin Solid Films

Volumn 416, Issue 1-2, 2002, Pages 92-96

  Minami, Tadatsugu ^a   Ida, Satoshi ^a   Miyata, Toshihiro ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Arc plasma evaporation; GZO; ITO; TCO film; Thin film; ZnO

Indexed keywords

DEPOSITION; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; EVAPORATION; INDIUM COMPOUNDS; PLASMA APPLICATIONS; SINTERING; VACUUM APPLICATIONS;

TRANSPARENT CONDUCTING OXIDES (TCO);

THIN FILMS;

EID: 0037009721     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00706-X     Document Type: Article

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