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Volumn 19, Issue 16, 2008, Pages
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Coulomb blockade effects in silicon nanoparticles embedded in thin silicon-rich oxide films
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Author keywords
[No Author keywords available]
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Indexed keywords
CAPACITANCE MEASUREMENT;
COULOMB BLOCKADE;
LOW PRESSURE CHEMICAL VAPOR DEPOSITION;
OXIDE FILMS;
SEMICONDUCTOR MATERIALS;
SILICA;
SILICON;
SILICON NANOPARTICLES;
SILICON OXIDE MATRIX;
NANOPARTICLES;
METAL OXIDE;
NANOPARTICLE;
QUANTUM DOT;
SILICON;
ARTICLE;
ELECTRICITY;
ELLIPSOMETRY;
FILM;
HIGH TEMPERATURE PROCEDURES;
LIGHT EMITTING DIODE;
MATHEMATICAL MODEL;
PRIORITY JOURNAL;
REFRACTION INDEX;
SEMICONDUCTOR;
THICKNESS;
X RAY PHOTOELECTRON SPECTROSCOPY;
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EID: 42449154697
PISSN: 09574484
EISSN: 13616528
Source Type: Journal
DOI: 10.1088/0957-4484/19/16/165401 Document Type: Article |
Times cited : (16)
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References (13)
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