Static dielectric constant of isolated silicon nanocrystals embedded in a SiO 2 thin film

Applied Physics Letters

Volumn 88, Issue 6, 2006, Pages

  Ng, C Y ^a   Chen, T P ^a   Ding, L ^a   Liu, Y ^a   Tse, M S ^a   Fung, S ^b   Dong, Z L ^c  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b UNIVERSITY OF HONG KONG   (Hong Kong)

^c NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ISOLATED SILICON NANOCRYSTALS; MAXWELL-GARNETT EFFECTIVE MEDIUM APPROXIMATION; STATIC DIELECTRIC CONSTANT;

APPROXIMATION THEORY; DATA STORAGE EQUIPMENT; NANOSTRUCTURED MATERIALS; PERMITTIVITY; SILICA; THIN FILMS;

SILICON;

EID: 32444451788     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2172009     Document Type: Article

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