Optical characterization of silicon rich oxide films

Sensors and Actuators, A: Physical

Volumn 142, Issue 1, 2008, Pages 12-18

  Morales Sanchez A ^a   Barreto, J ^a   Dominguez Horna C ^a   Aceves Mijares, M ^b   Luna Lopez J A ^b  

^a INSTITUTO DE MICROELECTRÓNICA DE BARCELONA   (Spain)

^b INSTITUTO NACIONAL DE ASTROFÍSICA   (Mexico)

Author keywords

EFTEM; FTIR; Photoluminescence; Silicon clusters; Silicon rich oxide; XPS

Indexed keywords

FOURIER TRANSFORM INFRARED SPECTROSCOPY; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; NANOCRYSTALS; OPTICAL PROPERTIES; PHOTOLUMINESCENCE; SILICA; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

REACTANT GASSES; SILICON CLUSTERS;

OXIDE FILMS;

EID: 38949198643     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2007.03.008     Document Type: Article

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