Advances in pulsed laser deposition of nitrides and their integration with oxides

Applied Surface Science

Volumn 127-129, Issue , 1998, Pages 431-439

  Vispute, R D ^a,b   Talyansky, V ^a   Sharma, R P ^a   Choopun, S ^a   Downes, M ^a   Venkatesan, T ^a   Li, Y X ^b   Salamanca Riba, L G ^b   Iliadis, A A ^c   Jones, K A ^d   McGarrity, J ^d  

^a Bldg 142   (United States)

^b UNIVERSITY OF MARYLAND   (United States)

^c UNIVERSITY OF MARYLAND   (United States)

^d U S ARMY RESEARCH LABORATORY   (United States)

Author keywords

Nitrides; Oxides; Pulsed laser deposition

Indexed keywords

DEPOSITION; EXCIMER LASERS; LASER ABLATION; PRESSURE EFFECTS; PULSED LASER APPLICATIONS; SAPPHIRE; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM COMPOUNDS; SEMICONDUCTING ZINC COMPOUNDS; THERMAL EFFECTS; TITANIUM NITRIDE; ZINC OXIDE;

ALUMINUM NITRIDE; PULSED LASER DEPOSITION (PLD);

SEMICONDUCTING FILMS;

EID: 4243340400     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(97)00668-5     Document Type: Article

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