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Volumn 171, Issue 1-2, 1997, Pages 12-20

Pulsed laser deposition of epitaxial AlN, GaN, and InN thin films on sapphire(0001)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHARGE CARRIERS; DEPOSITION; EPITAXIAL GROWTH; FILM GROWTH; PULSED LASER APPLICATIONS; SAPPHIRE; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM COMPOUNDS; SEMICONDUCTING INDIUM COMPOUNDS; X RAY CRYSTALLOGRAPHY;

EID: 0031546402     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(96)00284-9     Document Type: Article
Times cited : (65)

References (26)
  • 7
    • 30244504821 scopus 로고    scopus 로고
    • note
    • ESPI 5310 Deny Ave., Agoura Hills, CA 91301; impurities in the AlN powder were Ca 0.015%, Ni 0.015%, Fe 0.01% and Sn 0.005%.
  • 8
    • 30244502356 scopus 로고    scopus 로고
    • note
    • CERAC Inc., P.O. Box 1178, Milwaukee, WI 53201; impurities in the GaN powder were Si 0.01%, Al 0.004%, Ca 0.004%, Cu 0.0005% and Mg 0.0001%.
  • 9
    • 30244562509 scopus 로고    scopus 로고
    • note
    • CERAC Inc., P.O. Box 1178, Milwaukee, WI 53201; impurities in the InN powder were Fe 0.01%, Mg 0.007%, Al 0.0001%, Ca 0.0001% and Cu 0.0001%.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.